Fully Automatic Wafer Developer – 3D Model SolidWorks

The Coat/Develop Group System is a general purpose, high throughput wafer handling system with coaters, developers, vapor primers, HPO, cooling plates, etc. The Coat/Develop Group System can be used to process a large number of photoresists and photopolymers. Its sophisticated system software and reliable hardware configuration allow users to program the heating plate at various baking temperatures and simultaneously prime, coat, and develop the wafer. The system is highly scalable to meet business expansion or business process needs.